The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Jun. 03, 2014
Applicant:

Altek Semiconductor Corporation, Hsinchu, TW;

Inventors:

Hong-Long Chou, Taipei, TW;

Yu-Chih Wang, Tainan, TW;

Wen-Yan Chang, Miaoli County, TW;

Yao-Sheng Wang, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 5/217 (2011.01); G06T 7/00 (2006.01); H04N 17/00 (2006.01);
U.S. Cl.
CPC ...
H04N 5/217 (2013.01); G06T 7/0018 (2013.01); H04N 17/004 (2013.01);
Abstract

The present disclosure illustrates a lens distortion correction method to solve influence for distortion correction caused by an alignment error between a lens center and a center of image sensor unit during assembling. The present disclosure is characterized in that the spatial geometric calibration is incorporated with the lens distortion correction and different image centers are selected repeatedly when transformation relationship of image coordinates is used to perform the lens distortion correction, so as to correct the image center of the image to be corrected and enhance the accuracy of lens distortion correction.


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