The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Jun. 08, 2012
Applicant:

Wei-yo Chen, Hsinchu, TW;

Inventor:

Wei-Yo Chen, Hsinchu, TW;

Assignee:

Epistar Corporation, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 33/00 (2010.01); H01L 33/22 (2010.01); H01L 33/40 (2010.01); H01L 33/42 (2010.01);
U.S. Cl.
CPC ...
H01L 33/22 (2013.01); H01L 33/405 (2013.01); H01L 33/42 (2013.01);
Abstract

A light-emitting element includes: a light-emitting stack including an uneven upper surface; a transparent conductive layer formed on the uneven upper surface; an insulating layer formed on the transparent conductive layer and filling the uneven upper surface, and partial regions of the transparent conductive layer are exposed; a reflective layer formed on the transparent conductive layer and the insulating layer; and a contact interface including a current blocking area formed between the insulating layer and the reflective layer and a plurality of first contact regions formed between the transparent conductive layer and the reflective layer; and an electrode structure formed on the reflective layer, and the reflective layer is between the light-emitting stack and the electrode structure in a vertical direction of the light-emitting element; wherein the current blocking area and the plurality of first contact regions are coplanar.


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