The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Jun. 04, 2013
Apple Inc., Cupertino, CA (US);
Jan Erik Solem, San Francisco, CA (US);
Jerome Piovano, Palo Alto, CA (US);
Michael Rousson, Palo Alto, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
Techniques are provided to improve the performance and accuracy of landmark point detection using a Constrained Local Model. The accuracy of feature filters used by the model may be improved by supplying positive and negative sets of image data from training image regions of varying shapes and sizes to a linear support vector machine training algorithm. The size and shape of regions within which a feature filter is to be applied may be determined based on a variance in training image data for a landmark point with which the feature filter is associated. A sample image may be normalized and a confidence map generated for each landmark point by applying the feature filters as a convolution on the normalized image. A vector flow map may be pre-computed to improve the efficiency with which a mean landmark point is adjusted toward a corresponding landmark point in a sample image.