The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Dec. 12, 2011
Applicant:
Kap-kee Kim, Daejeon, KR;
Inventor:
Kap-Kee Kim, Daejeon, KR;
Assignee:
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE, Daejeon, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 5/00 (2006.01); G06T 5/50 (2006.01);
U.S. Cl.
CPC ...
G06T 5/002 (2013.01); G06T 5/005 (2013.01); G06T 5/50 (2013.01); G06T 2207/10021 (2013.01); G06T 2207/20144 (2013.01); G06T 2207/20182 (2013.01);
Abstract
Disclosed herein are an apparatus and method for correcting a disparity map. The apparatus includes a disparity map area setting unit, a pose estimation unit, and a disparity map correction unit. The apparatus removes the noise of the disparity map attributable to stereo matching and also fills in holes attributable to occlusion using information about the depth of a 3-dimensional (3D) model produced in a preceding frame of a current frame, thereby improving a disparity map and depth performance and providing high-accuracy depth information to an application to be used.