The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Jul. 22, 2011
Applicants:

Zhiyun Chen, Silver Spring, MD (US);

Erin F. Fleet, Springfield, VA (US);

Gregory D. Cooper, Arlington, VA (US);

Inventors:

Zhiyun Chen, Silver Spring, MD (US);

Erin F. Fleet, Springfield, VA (US);

Gregory D. Cooper, Arlington, VA (US);

Assignee:

PIXELLIGENT TECHNOLOGIES, LLC, Baltimore, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B82Y 30/00 (2011.01); G03F 1/62 (2012.01); G03F 7/09 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2041 (2013.01); B82Y 30/00 (2013.01); G03F 1/62 (2013.01); G03F 7/091 (2013.01); G03F 7/2002 (2013.01); G03F 7/004 (2013.01);
Abstract

Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.


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