The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Feb. 28, 2014
Applicant:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Inventors:
Padma Gopalan, Madison, WI (US);
Eungnak Han, Hillsboro, OR (US);
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/10 (2006.01); B32B 33/00 (2006.01); B32B 27/08 (2006.01); G03F 7/09 (2006.01); C08F 293/00 (2006.01); C09D 125/14 (2006.01); C09D 133/06 (2006.01); C09D 153/00 (2006.01); C08L 33/06 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/26 (2006.01); C08J 7/04 (2006.01); C08J 3/24 (2006.01); C08J 7/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/09 (2013.01); C08F 293/005 (2013.01); C08J 7/04 (2013.01); C08L 33/068 (2013.01); C09D 125/14 (2013.01); C09D 133/068 (2013.01); C09D 153/00 (2013.01); G03F 7/038 (2013.01); G03F 7/0388 (2013.01); G03F 7/165 (2013.01); G03F 7/26 (2013.01); C08F 2438/02 (2013.01); C08J 3/24 (2013.01); C08J 7/12 (2013.01); C08L 2312/00 (2013.01); Y10T 428/24174 (2015.01); Y10T 428/24802 (2015.01);
Abstract
The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.