The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Jan. 07, 2014
Samsung Electronics Co., Ltd., Suwon-si, KR;
Kyu-dong Jung, Suwon-si, KR;
Jong-hyeon Chang, Suwon-si, KR;
Seung-wan Lee, Suwon-si, KR;
Eun-sung Lee, Hwaseon-si, KR;
Min-seog Choi, Seoul, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
Provided is an aperture adjusting apparatus for adjusting an aperture through which light transmits. The aperture adjusting apparatus includes: a chamber configured to have space in which fluid flows, the chamber including a lower channel, an upper channel, and a plurality of reservoir regions connecting the lower channel and the upper channel and each having a non-uniform width crossing a flow direction of a fluid to form a space in which fluid flows; a photo-interceptive first fluid and a photo-transmissive second fluid having a property that the photo-transmissive second fluid does not mix with the first fluid and that are prepared in the chamber; and a first electrode unit in which one or more electrodes to which a voltage is applied are arrayed to form an electric field in the chamber, wherein an aperture through which light transmits is adjusted by a location change of an interface between the first fluid and the second fluid according to the electric field.