The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Jun. 20, 2012
Young Beom Kim, Suwon-si, KR;
Byung Kwan Park, Seoul, KR;
Seong Deok Lee, Seongnam-si, KR;
Jae Mock Yi, Hwaseong-si, KR;
Young Beom Kim, Suwon-si, KR;
Byung Kwan Park, Seoul, KR;
Seong Deok Lee, Seongnam-si, KR;
Jae Mock Yi, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
An apparatus and method for compensating for an artifact of higher order diffusion Magnetic Resonance Imaging (MRI) are provided. The apparatus includes a construction unit configured to construct a diffusion q-space matrix, a correction unit configured to correct an image shift in a phase encoding direction in the constructed diffusion q-space matrix, a reconstruction processing unit configured to reconstruct a q-space of a Diffusion Spectrum Imaging (DSI) based on the corrected image shift, and a tracking processing unit to process a DSI fiber tracking using the reconstructed q-space of the DSI.