The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Nov. 22, 2010
Applicants:

Norikazu Ito, Higashiomi, JP;

Koichiro Niira, Higashiomi, JP;

Shinichiro Inaba, Higashiomi, JP;

Inventors:

Norikazu Ito, Higashiomi, JP;

Koichiro Niira, Higashiomi, JP;

Shinichiro Inaba, Higashiomi, JP;

Assignee:

KYOCERA Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/26 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); C23C 16/24 (2006.01); C23C 16/44 (2006.01); C23C 16/452 (2006.01); C23C 16/505 (2006.01); H01L 21/02 (2006.01); H01L 31/18 (2006.01); H01L 31/20 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45574 (2013.01); C23C 16/24 (2013.01); C23C 16/4405 (2013.01); C23C 16/452 (2013.01); C23C 16/45563 (2013.01); C23C 16/505 (2013.01); H01J 37/3244 (2013.01); H01L 21/0262 (2013.01); H01L 21/02532 (2013.01); H01L 21/02573 (2013.01); H01L 31/1824 (2013.01); H01L 31/202 (2013.01); Y02E 10/545 (2013.01);
Abstract

First and second electrodes are apart from each other in a chamber. Plates are disposed on a substrate in the second electrode. Each of the plates comprises first and second parts for supplying first and second gas to a space between the first and second electrodes, respectively, a first supply path for first gas connected to the first part, and a second supply path for second gas connected to the second part. The substrate comprises a heater for the first gas, a first introducing path for introducing the first gas to the first supply path, and a second introducing path for introducing the second gas to the second supply path. The second supply path comprises a mainstream part without the second part and branch parts with the second part. A connecting portion of the second introducing path and the mainstream part is positioned in an adjacent portion of the plates.


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