The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Oct. 17, 2011
Applicants:
Alleppey V. Hariharan, Austin, TX (US);
Jagannathan Ravi, Bedford, MA (US);
Inventors:
Alleppey V. Hariharan, Austin, TX (US);
Jagannathan Ravi, Bedford, MA (US);
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/24 (2006.01); C23C 16/56 (2006.01); C23C 16/48 (2006.01);
U.S. Cl.
CPC ...
C23C 16/24 (2013.01); C23C 16/483 (2013.01); C23C 16/56 (2013.01);
Abstract
This application describes a bulk and thin film chemical vapor deposition (CVD) process using lasers to heat a silicon substrate to the required deposition temperature. It is primarily applicable to production of polysilicon by the decomposition of halosilanes in a chemical reactor. It is also suitable for other materials that use a CVD process to deposit material on a heated silicon substrate.