The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Apr. 27, 2012
Tomotake Nashiki, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Tomonori Noguchi, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
Tomotake Nashiki, Osaka, JP;
Hideo Sugawara, Osaka, JP;
Tomonori Noguchi, Osaka, JP;
Akira Hamada, Osaka, JP;
Yoshihisa Ito, Osaka, JP;
Kuniaki Ishibashi, Osaka, JP;
NITTO DENKO CORPORATION, Osaka, JP;
Abstract
A method of continuously subjecting an elongated substrate to vacuum film formation is disclosed. The method comprises the steps of: feeding a first substrate from a first roll chamber in a first direction from the first chamber toward a second roll chamber; degassing the first substrate; forming a film of a second material on the first substrate, in a second film formation chamber; and rolling up the first substrate in the second roll chamber, thereby producing the first substrate, and further comprises similar steps to produce a second substrate. In advance of producing the first substrate with the second material film, the first cathode electrode of the first film formation chamber is removed from the first film formation chamber, and, in advance of producing the second substrate with the first material film, the second cathode electrode of the second film formation chamber is removed from the second film formation chamber.