The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Sep. 16, 2011
John Link, Humble, TX (US);
Mike Hong, Shanghai, CN;
General Electric Company, Schenectady, NY (US);
Abstract
Methods and compositions are provided for inhibiting the polymerization of a vinyl aromatic monomer, such as styrene monomer, during elevated temperature processing or distillation thereof. The compositions comprise an inhibitor combination of (A) a hydroxylamine and (B) a stable free radical plus a retarder that is either; (C) dinitrobutylphenol or (D) quinone methide. The ratio of (A) to (B) ranges from about 5% (A) to 95% (B) to about 95% (A) to about 5% (B). The compositions are added to the vinyl aromatic monomer in amounts sufficient to prevent polymerization during the distillation process. Typically the inhibitor combination is added to the vinyl aromatic monomer in an amount ranging from about 10 to 150 ppm of the monomer. Retarders are typically added in an amount ranging from 50 to 1500 ppm of the vinyl aromatic monomer.