The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Aug. 28, 2012
Applicants:

Thomas Edward Mantkowski, Madeira, OH (US);

Meghan Meredith Olds, Houston, TX (US);

Nripendra Nath Das, West Chester, OH (US);

Inventors:

Thomas Edward Mantkowski, Madeira, OH (US);

Meghan Meredith Olds, Houston, TX (US);

Nripendra Nath Das, West Chester, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/00 (2006.01); B23K 9/235 (2006.01); B23P 6/00 (2006.01); C23G 5/00 (2006.01); F01D 25/00 (2006.01); B23K 1/20 (2006.01); B23P 6/04 (2006.01); C23G 5/028 (2006.01); C23G 5/04 (2006.01); F01D 5/00 (2006.01);
U.S. Cl.
CPC ...
B23K 9/235 (2013.01); B23K 1/206 (2013.01); B23P 6/007 (2013.01); B23P 6/045 (2013.01); C23G 5/00 (2013.01); C23G 5/02803 (2013.01); C23G 5/04 (2013.01); F01D 5/005 (2013.01); F01D 25/002 (2013.01); F05D 2230/72 (2013.01);
Abstract

Methods and apparatuses by which an oxidized metallic surface can be prepared for a subsequent repair operation without excessive removal of parent metal material. At least one gas is supplied to a limited portion of a metallic surface of a component, and the limited portion is locally heated in the presence of the gas to a treatment temperature sufficient to cause the gas or a gas that forms therefrom to chemically remove oxides from the limited portion of the metallic surface. At least a second portion of the metallic surface is not locally heated to the treatment temperature.


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