The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2015
Filed:
Mar. 27, 2012
Applicants:
Choon Gi Choi, Daejeon, KR;
Muhan Choi, Daejeon, KR;
Inventors:
Choon Gi Choi, Daejeon, KR;
Muhan Choi, Daejeon, KR;
Assignee:
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE, Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 15/02 (2006.01); B82Y 20/00 (2011.01); C04B 35/00 (2006.01); H01Q 15/00 (2006.01);
U.S. Cl.
CPC ...
H01Q 15/0086 (2013.01); B82Y 20/00 (2013.01);
Abstract
Provided are a metamaterial structure and a manufacturing method thereof. The metamaterial structure includes a dielectric layer, nanowires penetrating the dielectric layer and arranged in a spacing having negative refraction with respect to an electromagnetic wave incident on the dielectric layer, and coating layers formed between the nanowires and the dielectric layer.