The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2015
Filed:
Dec. 14, 2012
Jusung Engineering Co., Ltd., Gwangju-si, Gyeonggi-do, KR;
Sang Du Lee, Gwangju-si, KR;
Joung Sik Kim, Yongin-si, KR;
Joung Ho Ahn, Icheon-si, KR;
Rae Wook Jeong, Suwon-si, KR;
Byung Wook Jung, Gwangju-si, KR;
Beop Jong Jin, Gwangju-si, KR;
JUSUNG ENGINEERING CO., LTD., , KR;
Abstract
A method for manufacturing a solar cell capable of significantly reducing the amount of wastewater generated during a wet-etching process and improving the efficiency of the solar cell. A method comprising: texturing to form an uneven structure on one semiconductor substrate surface by etching the semiconductor substrate surface with a texturing device; forming a temporary layer at an upper portion of the semiconductor substrate surface to surround a first byproduct layer formed at a predetermined region of the semiconductor substrate surface during the texturing; and doping the semiconductor substrate surface with a predetermined dopant using a doping device to form a first semiconductor layer and a second semiconductor layer disposed above the first semiconductor layer and having a different polarity than the first semiconductor layer. The first byproduct layer and the temporary layer are simultaneously removed.