The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2015
Filed:
Feb. 22, 2013
Applicant:
Seiko Epson Corporation, Tokyo, JP;
Inventor:
Yoshitomo Kumai, Okaya, JP;
Assignee:
SEIKO EPSON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03B 23/037 (2006.01); C03C 17/00 (2006.01); C03C 17/34 (2006.01); G02B 1/10 (2015.01); G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
G02B 1/10 (2013.01); C03B 23/037 (2013.01); C03C 17/34 (2013.01); C03C 17/3447 (2013.01); G02B 5/3058 (2013.01);
Abstract
A method for producing a polarizing element includes: forming particulate materials containing a metal halide on a glass substrate; forming a protective film that covers the particulate materials in a plasma environment while reducing the metal halide constituting the particulate materials; and stretching the particulate materials by stretching the glass substrate and the protective film at a temperature at which the glass substrate is softened.