The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Aug. 14, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Timothy J. Dalton, Ridgefield, CT (US);

Ashish V. Jagtiani, Tarrytown, NY (US);

Ramachandran Muralidhar, Mahopac, NY (US);

Sufi Zafar, Briarcliff Manor, NY (US);

Assignee:

GLOBALFOUNDRIES INC, Grand Cayman, KY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/414 (2006.01);
U.S. Cl.
CPC ...
G01N 27/414 (2013.01);
Abstract

A sensing device includes a substrate having a source region and a drain region formed therein. A gate structure is formed over the substrate and includes a gate dielectric and a gate conductor. The gate conductor is formed on the gate dielectric and disposed between the source region and the drain region. A dielectric layer is formed over the substrate and has a depth configured to form a well over the gate conductor. A gate extension is formed in contact with or as part of the gate conductor and including a conductive material covering one or more surfaces of the well.


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