The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Mar. 27, 2013
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Dieter Kohlert, Pentling, DE;

Gerhard Poeppel, Regensburg, DE;

Franz Schreier, Planegg, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/00 (2006.01); G01N 21/61 (2006.01); G01N 21/3504 (2014.01); G01N 21/35 (2014.01);
U.S. Cl.
CPC ...
G01N 21/61 (2013.01); G01N 21/3504 (2013.01); G01N 2021/3513 (2013.01); G01N 2021/3595 (2013.01); G01N 2201/0636 (2013.01);
Abstract

A device can be used for establishing gas concentrations in an examination volume. A radiation source is configured to generate an electromagnetic beam. A beam guiding apparatus is arranged downstream of the radiation source. The beam guiding apparatus is configured to set a plurality of variations of beam guidance of the beam entering the beam guiding apparatus in an observation plane in the examination volume. A spectrometer is arranged downstream of the beam guiding apparatus. The spectrometer is configured to carry out a spectral analysis of the beam leaving the beam guiding apparatus. An evaluation unit is configured to establish in the observation plane a 2D concentration distribution for one or more gases in the examination volume on the basis of the spectral analysis for different variations of beam guidance.


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