The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Feb. 25, 2014
Applicants:

Lei Lian, Freemont, CA (US);

Quentin Walker, Freemont, CA (US);

Dermot Cantwell, Sunnyvale, CA (US);

Inventors:

Lei Lian, Freemont, CA (US);

Quentin Walker, Freemont, CA (US);

Dermot Cantwell, Sunnyvale, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/32 (2006.01); G01J 1/42 (2006.01);
U.S. Cl.
CPC ...
G01J 1/42 (2013.01); G01J 2001/4238 (2013.01);
Abstract

Monitoring of a pulsed plasma is described using an optical sensor. In one example, the invention includes receiving light emitted by a pulsed plasma in a semiconductor plasma processing chamber, sampling the received light at a sampling rate higher than a pulse rate of the pulsed plasma, wherein the sampled light has a periodic amplitude waveform and the sampling rate is higher than the period of the amplitude waveform, accumulating multiple sampled waveforms to form a mean waveform, and transmitting characteristics of the mean waveform to a chamber control tool.


Find Patent Forward Citations

Loading…