The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Aug. 12, 2010
Applicants:

Nicolas Swiergiel, Champs sur Marne, FR;

Catherine Bosquet, Chatillon Sous Bagneux, FR;

Sebastien Didierjean, Toulouse, FR;

Inventors:

Nicolas Swiergiel, Champs sur Marne, FR;

Catherine Bosquet, Chatillon Sous Bagneux, FR;

Sebastien Didierjean, Toulouse, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/16 (2006.01); G01B 11/14 (2006.01); G01N 19/02 (2006.01); G06K 9/00 (2006.01); G01B 11/00 (2006.01); G01B 7/16 (2006.01); G01L 1/22 (2006.01); G01M 5/00 (2006.01); G01S 17/46 (2006.01);
U.S. Cl.
CPC ...
G01B 11/002 (2013.01); G01B 7/18 (2013.01); G01L 1/2287 (2013.01); G01M 5/0016 (2013.01); G01M 5/0091 (2013.01); G01S 17/46 (2013.01);
Abstract

A strain gauge includes a substrate () for mounting an element () to be reversibly lengthened by a force applied while displaying a variation in the resistance thereof, the element () lengthening itself along an axis for measurement by the gauge. The gauge includes at least one contrast target () capable of reflecting an incident light beam, the at least one contrast target () being placed on the gauge in a predetermined position that makes it possible to predetermine the center of the axis (), for measurement by the strain gauge (), by detecting the position of the at least one contrast target ().


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