The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2015
Filed:
Apr. 14, 2010
Shinichi Tanifuji, Kobe, JP;
Kenji Yamamoto, Kobe, JP;
Hirofumi Fujii, Takasago, JP;
Yoshinori Kurokawa, Takasago, JP;
Shinichi Tanifuji, Kobe, JP;
Kenji Yamamoto, Kobe, JP;
Hirofumi Fujii, Takasago, JP;
Yoshinori Kurokawa, Takasago, JP;
Kobe Steel, Ltd., Kobe-shi, JP;
Abstract
Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target () and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (); and a rear surface magnet () disposed on the rear surface side of the target (). The rear surface magnet () has a non-ring-shaped first permanent magnet (A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet () and the magnetization direction of the rear surface magnet () is in the direction orthogonally intersecting the surface of the target ().