The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Dec. 06, 2012
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Naoko Ochi, Chiba, JP;

Shinyo Tamura, Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 4/02 (2006.01); C08F 4/649 (2006.01); C08F 4/6592 (2006.01); C08F 10/00 (2006.01); C08F 4/76 (2006.01); C08L 71/02 (2006.01); C08F 210/16 (2006.01); C08F 4/52 (2006.01); C08F 4/659 (2006.01);
U.S. Cl.
CPC ...
C08F 4/76 (2013.01); C08F 4/02 (2013.01); C08F 4/52 (2013.01); C08F 4/6494 (2013.01); C08F 210/16 (2013.01); C08L 71/02 (2013.01); C08F 4/6592 (2013.01); C08F 4/65912 (2013.01); C08F 4/65916 (2013.01); C08G 2650/34 (2013.01);
Abstract

An object of the present invention is to provide a method which can simply suppress fouling in a reactor and, according to the present invention, there is provided a method of polymerizing addition polymerizable monomers using a catalyst formed by bringing (A) a transition metal compound represented by the following general formula [3] or μ-oxo type transition metal compound dimer thereof and (B) an activating agent into contact with one another, the method comprising polymerizing addition polymerizable monomers in a solvent to which a surfactant-containing particle obtained by mixing a particle composed of an inorganic compound or an organic polymer, and at least one surfactant selected from the group consisting of a compound represented by the following general formula [1] and a compound represented by general formula [2] has been added.R—O—(—R—O—)-Q  [1]R'C(═O)NR  [2]LMX  [3].


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