The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Dec. 06, 2013
Chung-shan Institute of Science and Technology, Armaments Bureau, M.n.d, Taoyuan County, TW;
Chao-Wen Liang, Taoyuan County, TW;
Jhe-Syuan Lin, Taoyuan County, TW;
Min-Fang Lo, Taoyuan County, TW;
NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY, Taoyuan, TW;
Abstract
An exposure-suppressing imaging system has a first optical assembly forming a first image of an object on a focal plane thereof, a beam splitter positioned between the first optical assembly and the focal plane of the first optical assembly; an LCOS reflective light modulator positioned on the focal plane, and selectively and partially altering the reflectivity thereof to reflect the first image back to the beam splitter; a second optical assembly positioned on a side of the beam splitter and receiving the reflected first image to form a second image on a focal plane of the second optical assembly; a light sensor converting the second image into a signal; and a controller receiving the signal computed as a third image, and selectively controlling the reflectivity of the LCOS reflective light modulator according to whether the signal contains information of overexposure on the third image.