The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Apr. 16, 2012
Applicants:

Masaki Yamauchi, Osaka, JP;

Yasushi Sugawara, Osaka, JP;

Shinsuke Takeguchi, Osaka, JP;

Yoichiro Tsuji, Osaka, JP;

Hiroki Kusakabe, Osaka, JP;

Takashi Morimoto, Osaka, JP;

Inventors:

Masaki Yamauchi, Osaka, JP;

Yasushi Sugawara, Osaka, JP;

Shinsuke Takeguchi, Osaka, JP;

Yoichiro Tsuji, Osaka, JP;

Hiroki Kusakabe, Osaka, JP;

Takashi Morimoto, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 8/02 (2006.01); H01M 8/10 (2006.01);
U.S. Cl.
CPC ...
H01M 8/0273 (2013.01); H01M 2008/1095 (2013.01); H01M 2250/20 (2013.01); Y02E 60/50 (2013.01); Y02T 90/32 (2013.01);
Abstract

A close attachment region is provided on the outer side relative to an outer edge portion of a gas diffusion layer and on the inner side relative to the inner edge portion of a gasket as seen from the thickness direction of a polymer electrolyte membrane, such that separators and a frame member are closely attached to each other. Thus, it becomes possible to suppress an increase in the manufacturing cost and a reduction in the power generation performance, which is attributed to the impurity eluted from the gasket and flowing toward the gas diffusion layer.


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