The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Feb. 20, 2014
Industry-university Cooperation Foundation Sunmoon University, Chungcheongnam-do, KR;
Tae Sik Oh, Chungcheongnam-do, KR;
Ho Seob Kim, Incheon, KR;
Dae Wook Kim, Gyeonggi-do, KR;
Seung Joon Ahn, Daejeon, KR;
Industry-University Cooperation Foundation Sunmoon University, Chungcheongnam-do, KR;
Abstract
Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam.