The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Sep. 03, 2013
Applicant:
Shin-etsu Chemical Co., Ltd., Chiyoda-Ku, Tokyo, JP;
Inventors:
Motoyuki Yamada, Annaka, JP;
Shoji Akiyama, Annaka, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Chiyoda-Ku, Tokyo, unknown;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01); G03F 1/62 (2012.01); G03F 1/22 (2012.01); G03F 1/00 (2012.01); G03F 1/24 (2012.01);
U.S. Cl.
CPC ...
G03F 1/22 (2013.01); G03F 1/142 (2013.01); G03F 1/24 (2013.01); G03F 1/62 (2013.01); G03F 1/64 (2013.01);
Abstract
A pellicle for EUV including a silicon film and a mesh work structure supporting the silicon film, and this pellicle is improved in that the grid frames of the mesh work structure are tapered in such a manner that the width of each grid frame lessens as the distance from the silicon film is increased.