The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9195069 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 24, 2015

Filed:

Apr. 10, 2007
Applicants:

Hirohisa Tanaka, Kumagaya, JP;

Hideki Komatsuda, Ageo, JP;

Inventors:

Hirohisa Tanaka, Kumagaya, JP;

Hideki Komatsuda, Ageo, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/44 (2006.01); G03B 27/72 (2006.01); G03B 27/32 (2006.01); G02B 27/09 (2006.01); G03F 7/20 (2006.01); G03B 27/68 (2006.01); G03B 27/42 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0905 (2013.01); G02B 27/0961 (2013.01); G02B 27/0972 (2013.01); G03F 7/70108 (2013.01); G03F 7/70208 (2013.01); G03F 7/70275 (2013.01); G03F 7/70283 (2013.01);
Abstract

An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.


Find Patent Forward Citations

Tanaka, Hirohisa. (2015). Illumination optical apparatus, exposure apparatus, and device manufacturing method (U.S. Patent No. 9195069). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9195069

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