The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Mar. 21, 2014
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Yasushi Mizoguchi, Suwa, JP;

Hisako Kojima, Chino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01); G02B 27/01 (2006.01); G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0176 (2013.01); G02B 26/101 (2013.01); G02B 26/105 (2013.01); G02B 27/0149 (2013.01); Y10T 156/1052 (2015.01);
Abstract

An optical scanner manufacturing method includes overlapping a first substrate including a base portion region that becomes a base portion, a shaft portion region that becomes a shaft portion, and a support portion region that becomes a support portion, and a second substrate in which a frame-like concave portion, a first portion that is positioned inside the concave portion, and a frame-like second portion that is positioned outside the concave portion and has a light reflectance reduction function are formed on one surface, to bond the base portion region to the first portion and to bond the support portion region to the second portion, patterning the first substrate to form the base portion, the shaft portion, and the support portion, and cutting the second substrate from the other surface side to separate the first portion and the second portion from each other.


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