The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Dec. 18, 2014
Applicants:

Hideo Takezoe, Tokyo, JP;

Wonhoe Koo, Tokyo, JP;

Suzushi Nishimura, Yokohama, JP;

Soon Moon Jeong, Yokohama, JP;

Inventors:

Hideo Takezoe, Tokyo, JP;

Wonhoe Koo, Tokyo, JP;

Suzushi Nishimura, Yokohama, JP;

Soon Moon Jeong, Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/40 (2006.01); G02B 3/00 (2006.01); B29D 11/00 (2006.01); H01L 51/52 (2006.01); H01L 51/56 (2006.01); B29K 63/00 (2006.01); B29K 105/24 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0031 (2013.01); B29D 11/00365 (2013.01); B29D 11/00442 (2013.01); G02B 3/0037 (2013.01); H01L 51/5275 (2013.01); H01L 51/56 (2013.04); B29K 2063/00 (2013.01); B29K 2105/246 (2013.01);
Abstract

A microlens for an organic EL element, which is used by being disposed on a light-emitting surface of the organic EL element, said microlens comprising a cured resin layer having concavities and convexities formed on a surface thereof, wherein when a Fourier-transformed image is obtained by performing two-dimensional fast Fourier transform processing on a concavity and convexity analysis image obtained by analyzing a shape of the concavities and convexities by use of an atomic force microscope, the Fourier-transformed image shows a circular or annular pattern substantially centered at an origin at which an absolute value of wavenumber is 0 μm, and the circular or annular pattern is present within a region where an absolute value of wavenumber is within a range of 1 μmor less.


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