The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Jan. 06, 2011
Shinsuke Inoue, Kyoto, JP;
Kiyuki Noto, Kyoto, JP;
Shinsuke Inoue, Kyoto, JP;
Kiyuki Noto, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto, JP;
Abstract
A first flow rate adjustment mechanism () and a second flow rate adjustment mechanism () are controlled by a flow rate control unit () so that a carrier gas flows through a first supply path () and a second supply flow rate () at a predetermined flow rate. The flow rate control unit () includes cell flow rate control means () for controlling the first flow rate adjustment mechanism () and the second flow rate adjustment mechanism () so that the flow rate of the carrier gas introduced into a sample cell () in a sparging state, which is a state where the carrier gas is supplied from the first supply path () into a syringe pump (), and the flow rate of the carrier gas introduced into the sample cell () in a normal state.