The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Sep. 26, 2014
Applicant:

Fujifilm Corporation, Minato-ku, Tokyo, JP;

Inventors:

Yuusuke Iizuka, Ashigarakami-gun, JP;

Tatsuhiko Obayashi, Ashigarakami-gun, JP;

Naoyuki Morooka, Ashigarakami-gun, JP;

Takayasu Nagai, Ashigarakami-gun, JP;

Ayumi Someya, Ashigarakami-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/50 (2006.01); C08F 2/46 (2006.01); C08G 61/04 (2006.01); C08F 222/14 (2006.01); C08F 220/30 (2006.01); C08F 265/04 (2006.01); C08F 290/12 (2006.01); G02B 1/04 (2006.01); C08F 220/68 (2006.01); C08F 265/06 (2006.01); C08F 212/08 (2006.01); C08F 212/32 (2006.01); C08F 220/40 (2006.01); C08F 212/36 (2006.01);
U.S. Cl.
CPC ...
C08F 222/14 (2013.01); C08F 220/30 (2013.01); C08F 220/68 (2013.01); C08F 265/04 (2013.01); C08F 265/06 (2013.01); C08F 290/12 (2013.01); G02B 1/04 (2013.01); G02B 1/041 (2013.01); C08F 212/08 (2013.01); C08F 212/32 (2013.01); C08F 212/36 (2013.01); C08F 220/40 (2013.01); C08F 2222/145 (2013.01);
Abstract

A curable resin composition comprising a (meth)acrylate monomer having an aromatic ring, a non-conjugated vinylidene group-containing compound represented by the general formula below, and a thermal or a photo-radical polymerization initiator makes it possible to produce a cured product with minimized occurrence of burring during molding and high product yield after molding. The cured product has good heat coloration resistance and low Abbe's number. R, R, R, and Rrepresent a substituent and A represents an atomic group necessary for forming a cyclic structure.


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