The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Aug. 14, 2014
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventor:
Kimiaki Miyamoto, Ashigara-kami-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 11/00 (2006.01); H01L 27/12 (2006.01); H01L 29/786 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
B41J 11/0015 (2013.01); H01L 27/1292 (2013.01); H01L 29/66742 (2013.01); H01L 29/78636 (2013.01);
Abstract
A pattern formation method includes a first step of forming a film having a flat surface on an uneven structure including a concave portion exhibiting liquid repellency and a convex portion exhibiting lyophilic properties so as to cover the concave portion and the convex portion; and a second step of forming a pattern by drying the film.
Miyamoto, Kimiaki. (2015). Pattern formation method (U.S. Patent No. 9193180). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9193180
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile