The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Oct. 09, 2013
Dow Global Technologies Llc, Midland, MI (US);
Santhosh K. Ramalingam, Pearland, TX (US);
Christopher J. Siler, Hemlock, MI (US);
Steven D. Jons, Eden Prairie, MN (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
A hydroclone including: a vortex chamber () in fluid communication with the inlet (), a process fluid chamber () in fluid communication with the process fluid outlet (), an effluent separation chamber () located between the vortex chamber () and process fluid chamber () and including an outer circumferential surface (), a vortex flow barrier () located between the vortex chamber () and the effluent separation chamber (), an effluent barrier () located between the effluent separation chamber () and the process fluid chamber () including at least one opening (') near the outer circumferential surface (), and an effluent opening () centrally located within the effluent separation chamber () in fluid communication with the effluent outlet (); wherein the effluent separation chamber () has a median distance () between the vortex flow barrier () and effluent barrier () which is adjustable.