The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Aug. 21, 2008
Marc Abitbol, Jerusalem, IL;
Ian Melnick, Jerusalem, IL;
Ran Yam, Jerusalem, IL;
Haggai Herman, Givat Shmuel, IL;
Marc Abitbol, Jerusalem, IL;
Ian Melnick, Jerusalem, IL;
Ran Yam, Jerusalem, IL;
Haggai Herman, Givat Shmuel, IL;
VISIONIX LTD., Jerusalem, IL;
Abstract
A wavefront measurement system, for measurement of aberrations in the eye, and for measurement of the topography of the cornea of the eye. The system differs from previously available systems in that the wavefront measurement of the eye's aberrations can be performed as a function of eye accommodation. Furthermore, methods for reducing corneal reflection are described. Additionally, the use of a very short focal length Hartman Shack lenslet array enables a very wide range of low order aberrations, up to ±25 diopters, to be measured without any refocusing or motion of the system. Also, methods are described for enabling the presence of defects within the eye to be determined using the aberration measurement system. Another embodiment captures the pupil centering position without any projected illumination pattern being used, so that a subsequent accurate centering and focusing procedure can commence at the initially captured position, thus reducing measurement time.