The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Dec. 02, 2013
Applicant:

Shimadzu Research Laboratory (Shanghai) Co. Ltd., Shanghai, CN;

Inventors:

Hui Mu, Shanghai, CN;

Gongyu Jiang, Shanghai, CN;

Li Ding, Shanghai, CN;

Jianliang Li, Shanghai, CN;

Wenjian Sun, Shanghai, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01); H05K 3/10 (2006.01); B05D 3/00 (2006.01); C23C 14/34 (2006.01); H01J 49/06 (2006.01); H01J 49/42 (2006.01); H01J 37/04 (2006.01); C23C 14/00 (2006.01); C23C 18/18 (2006.01); C23C 14/04 (2006.01); H05K 1/11 (2006.01); H05K 3/00 (2006.01); H05K 3/14 (2006.01);
U.S. Cl.
CPC ...
H05K 3/107 (2013.01); B05D 3/002 (2013.01); B05D 5/12 (2013.01); C23C 14/34 (2013.01); H01J 37/04 (2013.01); H01J 49/063 (2013.01); H01J 49/421 (2013.01); C23C 14/0021 (2013.01); C23C 14/046 (2013.01); C23C 18/1806 (2013.01); H05K 1/119 (2013.01); H05K 3/0014 (2013.01); H05K 3/14 (2013.01);
Abstract

The present invention provides a method for preparing an ion optical device. A substrate is fabricated with a hard material adapted for a grinding process, the substrate at least including a planar surface, and including at least one insulating material layer. Next, one or more linear grooves are cut on the planar surface, to form multiple discrete ion optical electrode regions on the planar surface separated by the linear grooves. Then, conductive leads are fabricated on other substrate surfaces than the planar surface and in a through hole inside the substrate, to provide voltages required on ion optical electrodes. By using high-hardness materials in cooperation with high-precision machining, higher precision and a desired discrete electrode contour can be obtained.


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