The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Feb. 02, 2015
Applicant:

Xiamen Sanan Optoelectronics Technology Co., Ltd., Xiamen, CN;

Inventors:

Zhibai Zhong, Xiamen, CN;

Jianjian Yang, Xiamen, CN;

Wenxin Chen, Xiamen, CN;

Zhaoxuan Liang, Xiamen, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/04 (2010.01); H01L 33/00 (2010.01); H01L 33/32 (2010.01); H01L 33/38 (2010.01); H01L 27/15 (2006.01); H01L 33/06 (2010.01); H01L 33/10 (2010.01); H01L 33/24 (2010.01); H01L 33/40 (2010.01);
U.S. Cl.
CPC ...
H01L 33/0025 (2013.01); H01L 27/153 (2013.01); H01L 33/0075 (2013.01); H01L 33/04 (2013.01); H01L 33/06 (2013.01); H01L 33/10 (2013.01); H01L 33/24 (2013.01); H01L 33/32 (2013.01); H01L 33/382 (2013.01); H01L 33/405 (2013.01); H01L 33/40 (2013.01); H01L 2933/0016 (2013.01); H01L 2933/0083 (2013.01);
Abstract

An ultraviolet semiconductor light emitting device includes: a light-emitting epitaxial layer including an n-type semiconductor layer, a light-emitting layer, and a p-type semiconductor layer; a tunnel junction at a non-light-emitting surface of the light-emitting epitaxial layer and having a patterned structure with openings to expose the light-emitting epitaxial layer; an optical phase matching layer over a surface layer of the light-emitting epitaxial layer and transmissive of UV light; and a reflecting layer covering the entire tunneling junction and the optical phase matching layer. A patterned structure is provided over the tunnel junction for full-angle light reflection. Part of the tunneling junction forms ohmic contact with the low work function reflecting metal. The patterned distribution design can effectively reduce the ohmic contact resistance.


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