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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9190288 B1

PDFFull Text
Date of Patent:
Nov. 17, 2015

Filed:

Nov. 21, 2014

Pattern forming method

Applicants:

Hiroki Tanaka, Fuchu, JP;

Ryosuke Yamamoto, Kawasaki, JP;

Naoko Kihara, Matsudo, JP;

Inventors:

Hiroki Tanaka, Fuchu, JP;

Ryosuke Yamamoto, Kawasaki, JP;

Naoko Kihara, Matsudo, JP;

Assignee:

KABUSHIKI KAISHA TOSHIBA, Tokyo, JP;

Attorney:

Nixon & Vanderhye P.C.

Primary Examiner:

Stephanie Duclair

Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); B44C 1/22 (2006.01); C08F 2/00 (2006.01); C08F 4/00 (2006.01); H01L 21/308 (2006.01); B82Y 10/00 (2011.01); G11B 5/74 (2006.01); G11B 5/82 (2006.01); G11B 5/855 (2006.01); B81C 1/00 (2006.01); H01L 21/027 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); B81C 1/00031 (2013.01); B82Y 10/00 (2013.01); G11B 5/743 (2013.01); G11B 5/82 (2013.01); G11B 5/855 (2013.01); H01L 21/0271 (2013.01); H01L 21/3081 (2013.01); H01L 21/30604 (2013.01); B81C 2201/0149 (2013.01);
Abstract

A pattern forming method includes forming a coating film containing a hydrophilic first homopolymer having a first bonding group and a hydrophobic second homopolymer having a second bonding group capable of bonding with the first bonding group, forming a bond between the first and second bonding group to produce a block copolymer of the first and second homopolymers, and heating the coating film to microphase-separating the copolymer into a hydrophilic domain and a hydrophobic domain. The hydrophilic and hydrophobic domains are arranged alternately. The bond is broken, then selectively dissolving-removing either domain by a solvent to provide a polymer pattern of a remainder domain.

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