The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Feb. 08, 2012
Applicants:
Kaku Shigeta, Chiba, JP;
Shintaro Sugawara, Chiba, JP;
Tatsuo Shigeta, Chiba, JP;
Inventors:
Assignee:
THINK LABORATORY CO., LTD., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); G03F 7/40 (2006.01); H01L 21/033 (2006.01); H05K 3/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); H01L 21/033 (2013.01); H05K 3/061 (2013.01); H05K 2201/0323 (2013.01); Y10T 428/24479 (2015.01);
Abstract
Provided are a substrate with an etching mask which enables high definition patterning and a method of manufacturing the same. A photosensitive material is applied on a surface of a substrate, exposure and development of the photosensitive material are carried out to form a resist pattern, a DLC coating film is formed on the surface of the substrate and a surface of the resist pattern, and the DLC coating film formed on the resist pattern is separated together with the resist pattern to form a DLC pattern on the surface of the substrate.