The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Mar. 05, 2013
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Kalin Mitkov Atanassov, San Diego, CA (US);

James Wilson Nash, San Diego, CA (US);

Vikas Ramachandra, San Diego, CA (US);

Sergiu Radu Goma, San Diego, CA (US);

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/40 (2006.01); G01B 11/25 (2006.01); H04B 1/12 (2006.01); G06T 5/00 (2006.01); G06T 7/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/254 (2013.01); G01B 11/2513 (2013.01); G01B 11/2545 (2013.01); G06T 5/001 (2013.01); G06T 7/0057 (2013.01); H04B 1/12 (2013.01);
Abstract

A method for generating codes for a code mask is provided. A plurality of symbols may be arranged into an n1 by n2 symbol structure, where n1 and n2 are integer values. A plurality of codewords may be defined from different overlapping k1 by k2 windows within the symbol structure, wherein co-linear and spatially overlapping windows define unique codewords, and the codewords are unique in a first direction of the symbol structure but are repeated in a second direction that is perpendicular to the first direction. A plurality of the symbol structures as a code mask, wherein symbols in two adjacent k1 by k2 windows are selected so as to avoid codeword aliasing of codewords in the two adjacent k1 by k2 windows.


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