The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Aug. 08, 2012
Applicants:
Pei-rong Shieh, Kaohsiung, TW;
Tsai-fa Hsu, Kaohsiung, TW;
Po-cho Hsiao, Kaohsiung, TW;
Inventors:
Assignee:
ETERNAL MATERIALS CO., LTD., Kaohsiung, TW;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 5/34 (2006.01); C08L 33/04 (2006.01); C09D 11/106 (2014.01); H01L 31/0224 (2006.01); H01L 31/068 (2012.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
C09D 11/106 (2013.01); H01L 31/022425 (2013.01); H01L 31/068 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01);
Abstract
An etch-resistant composition is provided. The etch-resistant composition comprises a polymer and a first organic solvent. The polymer is prepared by copolymerizing a polymerization unit comprising styrene-based monomer(s) and acrylate-based monomer(s), and has a weight average molecular weight of at least about 35,000. Based on the total weight of the etch-resistant composition, the amount of the polymer is about 20.0 to about 60.0 wt % and the amount of the solvent is about 40.0 to about 80.0 wt %. The etch-resistant composition can be used for preparing a selective emitter of a solar cell.