The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Oct. 23, 2008
Applicant:

Sameer D. Mehta, Mason, OH (US);

Inventor:

Sameer D. Mehta, Mason, OH (US);

Assignee:

Equistar Chemicals, LP, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 23/00 (2006.01); C08L 23/06 (2006.01); C08L 23/08 (2006.01);
U.S. Cl.
CPC ...
C08L 23/06 (2013.01); C08L 23/0815 (2013.01); C08L 2205/03 (2013.01); C08L 2205/24 (2013.01);
Abstract

Disclosed is a polyethylene composition having faster crystallization rate and improved environmental stress cracking resistance. The polyethylene composition comprises a multimodal polyethylene and a nucleating agent. The multimodal polyethylene comprises from 25 to 50 wt % of a low molecular weight ethylene homopolymer component, from 25 to 50 wt % of a medium molecular weight ethylene copolymer component and from 25 to 50 wt % of a high molecular weight ethylene copolymer component. The polyethylene composition has an environmental stress cracking resistance (ASTM D1693, Condition B in 100% Igepal) greater than or equal to 40 days and a crystallization half time less than or equal to 70% of the crystallization half time of the multimodal polyethylene without nucleating agent.


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