The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Mar. 13, 2014
Applicant:

The United States of America, As Represented BY the Secretary of the Air Force, Washington, DC (US);

Inventors:

Loon-Seng Tan, Centerville, OH (US);

Jong-Beom Baek, Ulsan, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08G 83/00 (2006.01);
U.S. Cl.
CPC ...
C08G 83/005 (2013.01);
Abstract

The present invention includes novel ether-ketone hyperbranched polymers that are prepared from polymerizing trimesic acid and bifunctional phenylether-based liquid or low-melting monomers, which melt at or below polymerization temperature. The resulting copolymer has repeating units of the formula: wherein m is the degree of polymerization; n has a value of 0-5; the ratio x:y corresponds to the molar ratio of trimesic acid and arylether monomer and may range from 1.0:1.0 to 1.0:1.5 (i.e. x=1, y=1.0, 1.1, 1.2 . . . 1.5); and the substitution pattern of the arylether segment may be para or meta. The endgroups may be carboxylic acid (—COH), oxyphenyl (—OPh), or mixture of both moieties, depending on the reaction ratio x:y used. The total number of endgroups is typically defined by m+1.


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