The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Oct. 23, 2012
Applicant:

Denso Corporation, Kariya, Aichi-pref., JP;

Inventors:

Takuya Fuse, Nagoya, JP;

Kazutoshi Kuwayama, Kariya, JP;

Tadahiro Nakagawa, Nagoya, JP;

Assignee:

DENSO CORPORATION, Kariya, Aichi-pref., JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/30 (2006.01); B01J 8/02 (2006.01); C01B 3/04 (2006.01); C01B 3/56 (2006.01); B01J 8/04 (2006.01); B01J 8/06 (2006.01); B01J 19/00 (2006.01); B01J 19/24 (2006.01); B01J 8/00 (2006.01); B01J 35/00 (2006.01); B01J 35/02 (2006.01); C01B 3/00 (2006.01); C01B 3/02 (2006.01); C01B 3/50 (2006.01); C01B 3/58 (2006.01);
U.S. Cl.
CPC ...
C01B 3/047 (2013.01); B01J 8/0214 (2013.01); B01J 8/0285 (2013.01); B01J 8/0411 (2013.01); B01J 8/0496 (2013.01); B01J 8/067 (2013.01); C01B 3/56 (2013.01); B01J 2208/0053 (2013.01); B01J 2208/00141 (2013.01); B01J 2208/025 (2013.01); C01B 2203/0425 (2013.01); C01B 2203/0465 (2013.01); Y02E 60/364 (2013.01);
Abstract

A reactor includes a reaction part and a removal part. The reaction part is configured to generate at least two products as a result of a reaction of an unreacted material. The removal part is configured to selectively occlude at least one product from the at least two products so as to separate and remove the at least one product. The removal part includes an absorbent and a cooling unit. The absorbent releases heat at time of the selective occlusion of the at least one product. The cooling unit is configured to remove the heat released by the absorbent.


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