The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Mar. 25, 2014
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Koji Sonokawa, Haibara-gun, JP;
Tsubasa Fukuda, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
It is an object of the present invention to provide a process for making a lithographic printing plate that enables a one-bath processable lithographic printing plate having excellent printing durability, ink laydown and resistance to staining during printing. A process for making a lithographic printing plate is provided that includes a step of producing a negative-working lithographic printing plate precursor comprising, above a support, a photopolymerizable photosensitive layer comprising a vinylcarbazole compound-derived monomer unit-containing acrylic polymer and/or a urethane-acrylic hybrid polymer, a step of imagewise exposing the negative-working lithographic printing plate precursor, and a step of developing the exposed negative-working lithographic printing plate precursor by means of a developer having a pH of 4 to 10, comprising (Component A) a compound represented by Formula (I) below and (Component B) water, and having an organic solvent content of less than 5 mass %, wherein the process does not comprise a washing step or a gumming step before or after the development step. In Formula (I), Rdenotes a substituted or unsubstituted phenyl group, 1-naphthyl group, or 2-naphthyl group, and n denotes an integer of 4 to 20.