The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Feb. 06, 2012
Applicants:

Michael D. Wallom, Madison, WI (US);

Daniel Cunningham, Edgerton, WI (US);

Colin Roberts, Stevens Point, WI (US);

Daniel J. Lipscomb, Prairie Du Sac, WI (US);

Douglas Nelson, Madison, WI (US);

Andrew P. Block, Middleton, WI (US);

Scott Roelke, Marshall, WI (US);

Inventors:

Michael D. Wallom, Madison, WI (US);

Daniel Cunningham, Edgerton, WI (US);

Colin Roberts, Stevens Point, WI (US);

Daniel J. Lipscomb, Prairie Du Sac, WI (US);

Douglas Nelson, Madison, WI (US);

Andrew P. Block, Middleton, WI (US);

Scott Roelke, Marshall, WI (US);

Assignee:

Fiskars Brands, Inc., Madison, WI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B26F 1/36 (2006.01); B26F 1/40 (2006.01); B41K 3/02 (2006.01); B41K 3/36 (2006.01); B44B 5/00 (2006.01); B26D 7/26 (2006.01); B26D 7/00 (2006.01);
U.S. Cl.
CPC ...
B26F 1/36 (2013.01); B26F 1/405 (2013.01); B41K 3/02 (2013.01); B41K 3/36 (2013.01); B44B 5/0038 (2013.01); B44B 5/0085 (2013.01); B26D 7/2628 (2013.01); B26D 2007/0087 (2013.01); Y10T 83/7493 (2015.04); Y10T 83/8743 (2015.04); Y10T 83/883 (2015.04); Y10T 83/8828 (2015.04); Y10T 83/8831 (2015.04);
Abstract

A device for forming a pattern in a sheet of material is provided. The device includes a base having a detent portion and a locating portion that provides a first position, a platform moveably coupled to the base, and a punch supported by the platform and configured to move between a reset position and a depressed position. The platform includes a detent element configured to engage the detent portion when the platform is proximate the first position and a locating element configured to provide fine location of the platform in the first position relative to the base by engaging the locating portion. The punch forms a pattern in a sheet of material when the punch moves from the reset position to the depressed position and a sheet of material is present proximate the depressed position.


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