The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Mar. 30, 2012
Applicants:
Hideo Sakai, Tokyo, JP;
Yosuke Suzuki, Tokyo, JP;
Yoshihiro Tawara, Tokyo, JP;
Inventors:
Assignee:
HOYA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/04 (2012.01); B08B 3/04 (2006.01); B08B 3/12 (2006.01); B24B 37/08 (2012.01); G11B 5/84 (2006.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
B24B 37/044 (2013.01); B08B 3/04 (2013.01); B08B 3/12 (2013.01); B24B 37/08 (2013.01); C09G 1/02 (2013.01); G11B 5/8404 (2013.01);
Abstract
In a magnetic disk glass substrate manufacturing method, a main surface of a glass substrate is polished using a polishing liquid containing colloidal silica abrasive particles as polishing abrasive particles and a surface plate with a polishing pad, then the glass substrate is brought into contact with a liquid containing a coagulant so that the colloidal silica abrasive particles are coagulated, and then the colloidal silica abrasive particles coagulated are removed.