The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Mar. 28, 2012
Jens Frackenpohl, Frankfurt, DE;
Thomas Müller, Frankfurt, DE;
Ines Heinemann, Hofheim, DE;
Pascal Von Koskull-döring, Leverkusen, DE;
Christopher Hugh Rosinger, Hofheim, DE;
Isolde Häuser-hahn, Leverkusen, DE;
Martin Jeffrey Hills, Idstein, DE;
Jens Frackenpohl, Frankfurt, DE;
Thomas Müller, Frankfurt, DE;
Ines Heinemann, Hofheim, DE;
Pascal Von Koskull-Döring, Leverkusen, DE;
Christopher Hugh Rosinger, Hofheim, DE;
Isolde Häuser-Hahn, Leverkusen, DE;
Martin Jeffrey Hills, Idstein, DE;
BAYER INTELLECTUAL PROPERTY GMBH, Monheim, DE;
Abstract
Substituted 5-(cyclohex-2-en-1-yl)-penta-2,4-dienes and 5-(cyclohex-2-en-1-yl)-pent-2-en-4-ynes as active agents against abiotic stress in plants The invention relates to substituted 5-(cyclohex-2-en-1-yl)penta-2,4-dienes and 5-(cyclohex-2-en-1-yl)pent-2-en-4-ynes of the formula (I) and their salts where the radicals R, R, R, R, [X—Y] and Q are each as defined in the description, to processes for preparation thereof and to the use thereof for enhancing stress tolerance in plants with respect to abiotic stress, and/or for increasing plant yield.