The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2015

Filed:

Feb. 26, 2010
Applicants:

Youming LI, San Jose, CA (US);

Jeffrey Birkmeyer, San Jose, CA (US);

Inventors:

Youming Li, San Jose, CA (US);

Jeffrey Birkmeyer, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/50 (2006.01); C23C 14/54 (2006.01); H01J 37/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/50 (2013.01); C23C 14/3407 (2013.01); C23C 14/541 (2013.01); H01J 37/32467 (2013.01); H01J 37/32522 (2013.01); H01J 37/32715 (2013.01); H01J 37/32724 (2013.01); H01J 37/34 (2013.01); H01J 37/347 (2013.01); H01J 37/3488 (2013.01);
Abstract

A physical vapor deposition apparatus includes a vacuum chamber having side walls, a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target, a radio frequency power supply configured to apply power to the cathode, an anode inside and electrically connected to the side walls of the vacuum chamber, and a chuck inside and electrically isolated from the side walls of the vacuum chamber, the chuck configured to support a substrate, and a heater to heat the substrate supported on the chuck. The chuck includes a body and a graphite heat diffuser supported on the body and configured to contact the substrate.


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