The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2015
Filed:
Mar. 02, 2015
Applicant:
Seagate Technology Llc, Cupertino, CA (US);
Inventors:
Michael Feldbaum, San Jose, CA (US);
Koichi Wago, Sunnyvale, CA (US);
David Kuo, Palo Alto, CA (US);
Assignee:
Seagate Technology LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); G11B 5/84 (2006.01); G11B 5/855 (2006.01); C23C 14/06 (2006.01); C23C 14/08 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); C23C 14/0605 (2013.01); C23C 14/08 (2013.01); G11B 5/84 (2013.01); G11B 5/8408 (2013.01); G11B 5/855 (2013.01); Y10T 428/24612 (2015.01);
Abstract
Provided herein is a method including conformally depositing a first layer over a patterned resist; depositing a second, thicker layer over the first layer; etching the second layer to expose the first layer; and patterning a magnetic layer by ion implantation in accordance with the patterned resist to form a patterned magnet layer.