The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2015
Filed:
Oct. 02, 2012
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Shintarou Tsukigata, Annaka, JP;
Toshifumi Matsuoka, Annaka, JP;
Takenori Watabe, Annaka, JP;
Hiroyuki Otsuka, Annaka, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/042 (2014.01); C23C 10/00 (2006.01); C23C 10/18 (2006.01); C23C 10/60 (2006.01); C23C 28/04 (2006.01); C23C 10/20 (2006.01); H01L 21/22 (2006.01); H01L 31/068 (2012.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
C23C 10/00 (2013.01); C23C 10/18 (2013.01); C23C 10/20 (2013.01); C23C 10/60 (2013.01); C23C 28/042 (2013.01); C23C 28/048 (2013.01); H01L 21/2225 (2013.01); H01L 31/068 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01);
Abstract
A coating fluid comprising a boron compound, an organic binder, a silicon compound, an alumina precursor, and water and/or an organic solvent is used to diffuse boron into a silicon substrate to form a p-type diffusion layer. The coating fluid is spin coated onto the substrate to form a uniform coating having a sufficient amount of impurity whereupon a p-type diffusion layer having in-plane uniformity is formed.